Semiconductor exposure apparatus and parameter check method
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United States of America Patent
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Mar 23, 2004
Grant Date -
N/A
app pub date -
Jul 5, 2000
filing date -
Jul 5, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An apparatus adapted for exposing a semiconductor is controlled by a program using a plurality of parameters. The apparatus has an extraction device that extracts a parameter, from the plurality of parameters, of which a settable range is changed due to an upgrade of the program. An edit device edits a value of an extracted parameter extracted by the extraction device.
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