Developing method and developing apparatus
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United States of America Patent
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Mar 30, 2004
Issued Date -
N/A
app pub date -
Mar 29, 2002
filing date -
Mar 15, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A solution having a photosensitive radical is applied onto a resist film, a developing solution is applied thereonto, and the entire surface of the solution having the photosensitive radical is exposed all at once. Developing of the resist film progresses all at once after a coating film of the solution having the photosensitive radical dissolves in the developing solution, and hence time difference in the start time of developing does not occur in the surface of a substrate, thereby enabling uniform developing and an improvement in line width uniformity (CD value uniformity) in the surface of the substrate.
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