Plasma confinement by use of preferred RF return path
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United States of America Patent
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Apr 6, 2004
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N/A
app pub date -
Apr 8, 2003
filing date -
Apr 30, 2001
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Abstract
A confinement assembly for confining a discharge within an interaction space of a plasma processing apparatus comprising a stack of rings and at least one electrically conductive member. The rings are spaced apart from each other to form slots therebetween and are positioned to surround the interaction space. At least one electrically conductive member electrically couples each ring. The electrically conductive member contacts each ring at least at a point inside of the outer circumference of each ring.
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