Data path for high performance pattern generator
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United States of America Patent
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Apr 6, 2004
Grant Date -
N/A
app pub date -
Feb 11, 2002
filing date -
Sep 9, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A high-speed datapath for a high-performance pattern generator such as an analog SLM for generating the image is disclosed. The data path has provisions for completely independent parallel data flows giving true scalability to arbitrarily high throughput. In a preferred embodiment areas on the SLM are assigned to specific rasterizing and fracturing processors. There is an overlap between fields for blending of the edges in the pattern and for computation of interaction between features in the pattern. The datapath has data integrity checks and a recovery mode when an error condition is raised, allowing it to recover from most errors without creating new errors.
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