US Patent No: 6,717,097

Number of patents in Portfolio can not be more than 2000

Data path for high performance pattern generator

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Abstract

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A high-speed datapath for a high-performance pattern generator such as an analog SLM for generating the image is disclosed. The data path has provisions for completely independent parallel data flows giving true scalability to arbitrarily high throughput. In a preferred embodiment areas on the SLM are assigned to specific rasterizing and fracturing processors. There is an overlap between fields for blending of the edges in the pattern and for computation of interaction between features in the pattern. The datapath has data integrity checks and a recovery mode when an error condition is raised, allowing it to recover from most errors without creating new errors.

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First Claim

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Patent Owner(s)

Patent OwnerAddressTotal Patents
MICRONIC LASER SYSTEMS ABTABY110

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sandstrom, Torbjorn Pixbo, SE 91 1976
Thuren, Anders Taby, SE 7 154

Cited Art Landscape

Patent Info (Count) # Cites Year
 
University of Massachusetts (1)
5,864,146 System for quantitative radiographic imaging 132 1996
 
EASOM ENGINEERING AND MANUFACTURING CORPORATION (1)
5,631,721 Hybrid illumination system for use in photolithography 104 1995
 
EASTMAN KODAK COMPANY (1)
* 4,977,458 Apparatus for addressing a font to suppress Moire patterns occurring thereby and a method for use therein 30 1988
 
VIRGINIA POLYTECHNIC INSTITUTE AND STATE UNIVERSITY (1)
* 6,038,041 Three-dimensional holographic fluorescence microscope 8 1998
* Cited By Examiner

Patent Citation Ranking

Forward Cite Landscape

Patent Info (Count) # Cites Year
 
HITACHI HIGH-TECHNOLOGIES CORPORATION (2)
* 7,608,844 Charged particle beam drawing apparatus 1 2005
* 2005/0285,054 Charged particle beam drawing apparatus 4 2005
 
ADOBE SYSTEMS INCORPORATED (2)
* 7,365,743 Assignments for parallel rasterization 5 2002
7,719,538 Assignments for parallel rasterization 1 2008
 
KLEO AG (1)
8,248,581 Exposure system 1 2008
 
Micronic Laser Systems AB (20)
6,950,194 Alignment sensor 2 2002
* 7,167,231 Method and apparatus for printing large data flows 5 2003
* 2006/0055,903 Method and apparatus for printing large data flows 5 2003
6,987,599 Pattern generator mirror configurations 5 2003
* 2003/0202,233 Pattern generator mirror configurations 2 2003
7,106,490 Methods and systems for improved boundary contrast 11 2003
* 6,833,854 Method for high precision printing of patterns 20 2003
* 2004/0251,430 METHOD FOR HIGH PRECISION PRINTING OF PATTERNS 9 2003
7,186,486 Method to pattern a substrate 5 2003
7,755,657 Method for high precision printing of patterns 3 2004
7,618,751 RET for optical maskless lithography 15 2005
* 2005/0219,502 RET for optical maskless lithography 28 2005
7,542,129 Patterning apparatuses and methods for the same 17 2005
* 2006/0039,651 Patterning apparatuses and methods for the same 3 2005
7,705,963 Pupil improvement of incoherent imaging systems for enhanced CD linearity 1 2005
7,650,588 Methods and systems for pattern generation based on multiple forms of design data 14 2006
* 2007/0130,558 Methods and systems for pattern generation based on multiple forms of design data 7 2006
7,842,926 Method and device for correcting SLM stamp image imperfections 6 2008
* 2008/0244,371 METHOD AND DEVICE FOR DATA INTEGRITY CHECKING 0 2008
* 2009/0303,571 Spatial Light Modulator with Structured Mirror Surfaces 1 2009
 
Micronic Mydata AB (1)
8,077,377 Spatial light modulator with structured mirror surfaces 0 2009
 
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (2)
* 8,473,877 Striping methodology for maskless lithography 0 2011
* 2013/0061,187 STRIPING METHODOLOGY FOR MASKLESS LITHOGRAPHY 1 2011
 
SYNDIANT, INC. (11)
7,667,678 Recursive feedback control of light modulating elements 0 2006
8,189,015 Allocating memory on a spatial light modulator 0 2006
8,089,431 Instructions controlling light modulating elements 0 2006
* 8,035,627 Bit serial control of light modulating elements 0 2006
* 8,004,505 Variable storage of bits on a backplane 2 2006
* 2006/0268,022 Allocating Memory on a Spatial Light Modulator 1 2006
8,120,597 Mapping pixel values 1 2006
* 7,924,274 Masked write on an array of drive bits 3 2006
* 2006/0274,002 Masked Write On An Array of Drive Bits 0 2006
8,558,856 Allocation registers on a spatial light modulator 0 2012
8,766,887 Allocating registers on a spatial light modulator 0 2013
 
Mycronic AB (1)
9,291,902 Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image 0 2013
 
ASML NETHERLANDS B.V. (3)
7,965,373 Lithographic apparatus and device manufacturing method utilizing a datapath having a balanced calculation load 4 2005
* 2007/0009,146 Lithographic apparatus and device manufacturing method utilizing a datapath having a balanced calculation load 9 2005
* 2010/0020,300 MEASUREMENT APPARATUS AND METHOD 9 2009
 
KLA-TENCOR CORPORATION (1)
8,893,059 Pattern data system for high-performance maskless electron beam lithography 0 2013
 
ASML HOLDING N.V. (10)
7,133,121 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region 6 2005
* 2007/0146,672 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region 5 2006
7,777,861 Methods, systems, and computer program products for printing patterns on photosensitive surfaces 0 2007
* 2008/0079,923 Methods, Systems, and Computer Program Products for Printing Patterns on Photosensitive Surfaces 4 2007
7,773,199 Methods and systems to compensate for a stitching disturbance of a printed pattern 0 2007
7,630,054 Methods and systems to compensate for a stitching disturbance of a printed pattern 0 2007
* 2008/0094,595 Methods and systems to compensate for a stitching disturbance of a printed pattern 3 2007
* 2008/0094,596 Methods and systems to compensate for a stitching disturbance of a printed pattern 3 2007
7,688,423 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones 1 2008
* 2009/0033,893 Methods and Systems to Compensate for a Stitching Disturbance of a Printed Pattern in a Maskless Lithography System Not Utilizing Overlap of the Exposure Zones 3 2008
* Cited By Examiner