Apparatus and method for vaporizing solid precursor for CVD or atomic layer deposition
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United States of America Patent
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Apr 6, 2004
Grant Date -
Mar 20, 2003
app pub date -
Sep 14, 2001
filing date -
Sep 14, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An apparatus and method for effectively and controllably vaporizing a solid precursor material is provided. In particular, the present invention provides an apparatus that includes a housing defining a sealed interior volume having an inlet for receiving a carrier gas, at least one surface within the housing for the application of a solid precursor, and a heating member for heating the solid precursor. The heating member can be located in the housing or in the surface within the housing. The surface can be a rod, baffle, mesh, or grating, and is preferably s-shaped or cone-shaped. Optionally, an outlet connects the housing to a reaction chamber. A method for vaporizing a solid precursor using the apparatus of the present invention is also provided.
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