System and method for determining a position error in a wafer handling device
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United States of America Patent
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Apr 6, 2004
Grant Date -
N/A
app pub date -
Oct 12, 2000
filing date -
Dec 16, 1999
priority date (Note) -
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status (Latency Note)
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Abstract
A system for determining a position error in a wafer handling device includes a control module, an image acquisition module, and an image analysis module. The control module moves a workpiece having one or more reference marks, and the image acquisition module captures an image of at least one reference mark. The image analysis module, which is coupled to the image acquisition module, compares the captured image to stored target information to determine a position error.
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