Process for producing a tube-shaped cathode sputtering target
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United States of America Patent
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Apr 13, 2004
Grant Date -
May 15, 2003
app pub date -
Dec 19, 2001
filing date -
Dec 19, 2000
priority date (Note) -
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status (Latency Note)
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Abstract
A process for producing a tube target for cathode sputtering plants, in which the tube target is formed from a metallic inner tube (target holder) made of a first material with a first melting point of T.sub.s1.gtoreq.900 K and a metallic outer tube (target) that concentrically surrounds the inner tube and that is made of a second material with a second melting point of T.sub.s2.ltoreq.800 K. The inside diameter of the outer tube and the outside diameter of the inner tube are proportioned in such a way that the two tubes fit together tightly and are mechanically firmly joined. The outer tube is formed by casting the second material in a molten state in a heated, vertical, cylindrical permanent mold, which has a heated mandrel that constitutes the inner tube. After a space between the mold and the inner tube has been filled with the molten second material, a first thermal gradient develops between the inner tube and the mold, a second thermal gradient develops between the bottom and the top of the mold, and the outer tube is simultaneously cooled from the inside to the outside and from the bottom to the top.
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