Multilayer microstructures and laser based method for precision and reduced damage patterning of such structures

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United States of America Patent

PATENT NO 6719916
APP PUB NO 20030194882A1
SERIAL NO

10122236

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Many integrated circuits require a multilayer structure which contains layer of an organic or polymeric material with a patterned metallic layer on it. Laser patterning has many favorable characteristics but it also damages the organic or polymeric material. A novel method is disclosed that makes possible laser patterning of conductive metal electrode deposited on top of an organic and/or polymeric material without significant ablation of the organic and/or polymeric material. The method can achieve higher patterning resolution, resulting in higher quality integrated circuits. The method is based on the application of a thin coating of an inexpensive anti-reflector deposited on top of the desired metal electrode which in turn lies on the organic and/or polymeric material. The thin anti-reflecting coating allows the use of a lower fluence laser for ablation of metal layer without damaging the underlying organic and/or polymeric material.

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Patent Owner(s)

Patent OwnerAddress
NATIONAL RESEARCH COUNCIIL OF CANADAINTELLECTUAL PROPERTY SERVICES BLDG M-58 ROOM EG-12 MONTREAL ROAD OTTAWA ONTARIO K1A OR6

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dubowski, Jan J Ottawa, CA 10 46
Py, Christophe Ottawa, CA 10 272
Tao, Ye Ottawa, CA 113 776

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