Method for forming a cantilever beam model micro-electromechanical system
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United States of America Patent
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Apr 13, 2004
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app pub date -
Mar 19, 2003
filing date -
Mar 19, 2003
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Abstract
A cantilever beam type micro-electromechanical system (MEMS) is formed on a substrate. Two first electrodes are formed in a first dielectric layer on the substrate and a waveguide line is formed between the first electrodes. A patterned sacrificial layer and an arm layer are formed on the substrate. Two second electrodes and a second dielectric layer are formed in the arm layer, and an optical grating is formed in the second dielectric layer. Finally, a cap layer is formed on the substrate, and the patterned sacrificial layer is removed.
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