Method and apparatus for fault detection of a processing tool and control thereof using an advanced process control (APC) framework
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Apr 20, 2004
Grant Date -
N/A
app pub date -
Jul 31, 2000
filing date -
Jul 31, 2000
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method and apparatus for providing fault detection in an Advanced Process Control (APC) framework. A first interface receives operational state data of a processing tool related to the manufacture of a processing piece. The state data is sent from the first interface to a fault detection unit. A fault detection unit determines if a fault condition exists with the processing tool based upon the state data. A predetermined action is performed on the processing tool in response to the presence of a fault condition. In accordance with one embodiment, the predetermined action is to shutdown the processing tool so as to prevent further production of faulty wafers.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully