Method and apparatus for the preparation of clean gases
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United States of America Patent
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-
May 11, 2004
Grant Date -
May 15, 2003
app pub date -
Jun 2, 1995
filing date -
Dec 2, 1992
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing apparatus and adsorption and/or absorption apparatus so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.
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