Apparatus for detecting defect in device and method of detecting defect

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United States of America Patent

PATENT NO 6734687
SERIAL NO

09936941

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Abstract

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Disconnection defects, short-circuit defects and the like in wiring patters of submicron sizes within TEGs (a square of 1 to 2.5 mm for each) numerously arranged in a large chip (a square of 20 to 25 mm) can be inspected with respect to all the TEGs, with good operability, high reliability and high efficiency. A conductor probe for applying voltage to the wiring patterns by mechanical contact is composed of synchronous type conductor probe that synchronizes with movement of a sample stage (16), and fixed type conductor probe means (21) that is relatively fixed to an FIB generator (10). Positions of probe tips are superimposed to an SIM image and displayed on a display unit (19).

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Patent Owner(s)

Patent OwnerAddress
HITACHI LTDTOKYO 100-8280
HITACHI ULSI SYSTEMS CO LTDTOKYO JAPAN TOKYO METROPOLIS

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Azuma, Junzo Hitachiota, JP 9 189
Ishitani, Tohru Hitachinaka, JP 73 1455
Koike, Hidemi Hitachinaka, JP 41 1175
Sekihara, Isamu Fussa, JP 13 224
Sugimoto, Aritoshi Tokyo, JP 52 959
Tomimatsu, Satoshi Kokubunji, JP 80 1557
Umemura, Kaoru Musashino, JP 90 1953

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