Radio frequency power source for generating an inductively coupled plasma
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United States of America Patent
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May 25, 2004
Grant Date -
Sep 12, 2002
app pub date -
Jan 14, 2002
filing date -
Jul 13, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A system for converting DC power (22) into an RF electromagnetic field in a processing chamber, the system being composed of: a coil (16) constructed to surround the processing chamber; and an RF power generator (20) including a free-running oscillator (26) having a DC power input and an RF power output, the power output connected to a load impedance which includes the coil for supplying RF current to the coil at a frequency which is dependent on the load impedance.
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