Multi-zone resistance heater
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United States of America Patent
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-
May 25, 2004
Grant Date -
N/A
app pub date -
Sep 17, 2002
filing date -
Sep 29, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A substrate holder for holding a substrate (e.g., a wafer or an LCD panel) during plasma processing. The substrate holder is a stack of processing elements which each perform at least one function. The elements include an electrostatic chuck (102), an He gas distribution system (122), multi-zone heating plates (132), and multi-zone cooling system (152). Each element is designed to match the characteristic of the processing system, e.g., by applying heat based on a heat loss characteristic of the substrate during normal processing. The integrated design allows for precise control of the operating conditions, including, but not limited to, fast heating and fast cooling of a substrate.
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