OPTICAL INTERFERENCE TYPE PANEL AND THE MANUFACTURING METHOD THEREOF
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United States of America Patent
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-
Jun 8, 2004
Grant Date -
Jul 1, 2004
app pub date -
Mar 13, 2003
filing date -
Dec 27, 2002
priority date (Note) -
Granted
status (Latency Note)
Importance
Abstract
A manufacturing method for optical interference type panel is provided. A patterned supporting layer is formed on a transparent substrate, and then a first electrode layer and an optical film are formed sequentially on the supporting layer and the transparent substrate. A sacrificial material layer is formed on the optical layer, and then, a backside exposure process is performed by using the supporting layer as a mask to pattern the sacrificial material layer. A portion of the patterned sacrificial material layer is removed to expose the optical film above the supporting layer to form a sacrificial layer, and then a second electrode layer is formed on the sacrificial layer between the adjacent supporting layers and portion of the optical film. Afterwards, the sacrificial layer is removed.
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