Apparatus for developing substrate
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United States of America Patent
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Jun 15, 2004
Grant Date -
Jun 26, 2003
app pub date -
Dec 26, 2002
filing date -
Dec 26, 2001
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A developer supply nozzle moves from a first end toward a second end of a substrate for supplying a developer to the overall main surface of the substrate. After a lapse of a required developing time, a rinse discharge nozzle moves from the first end toward the second end of the substrate for supplying a rinse to the overall main surface of the substrate. A partition plate is provided for preventing the rinse discharged from a slit discharge port of the rinse discharge nozzle onto the substrate from flowing frontward in the direction of movement of the rinse discharge nozzle or washing away the developer supplied onto the substrate frontward.
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