Method and apparatus for forming an anti-reflective coating on a substrate
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United States of America Patent
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Jun 15, 2004
Grant Date -
Apr 24, 2003
app pub date -
Oct 24, 2001
filing date -
Oct 24, 2001
priority date (Note) -
Expired
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Abstract
In a method of depositing a titanium oxide layer on a substrate, a substrate is placed on a support in a process zone of a sputtering chamber. A target containing titanium faces the substrate. A sputtering gas containing an oxygen-containing gas, such as oxygen, and a non-reactive gas, such as argon, is introduced into the process zone. A pulsed DC voltage is applied to the target to sputter titanium from the target. The sputtered titanium combines with oxygen from the oxygen-containing gas to form a titanium oxide layer on the substrate. A multiple layer titanium oxide deposition process may also be implemented.
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