Apparatus for preforming measurement of a dimension of a test mark for semiconductor processing
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United States of America Patent
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Jun 15, 2004
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N/A
app pub date -
Jul 17, 2002
filing date -
Sep 29, 1998
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Expired
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Abstract
Apparatus for performing measurement of a dimension of a test marked formed by overlapping feature imaged onto a an image forming layer of a semiconductor wafer and the calculation of the critical dimensions of the features from test mark. This is used in semiconductor processing. Also included is software configured to program a measurement device to perform the measurement and calculation of the dimension of a test mark.
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