Method and apparatus for transferring a semiconductor substrate
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United States of America Patent
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-
Jun 22, 2004
Grant Date -
Dec 19, 2002
app pub date -
Jun 13, 2001
filing date -
Jun 13, 2001
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method and apparatus for transferring a substrate is provided. In one embodiment, an apparatus for transferring a substrate includes at least one end effector. A disk is rotatably coupled to the end effector. The disk is adapted to rotate the substrate relative to the end effector. The end effector may additionally include a sensor coupled thereto. The sensor is adapted to detect an indicia of orientation of the substrate supported by the end effector. In another embodiment, a method for transferring a substrate includes rotating the substrate disposed on an end effector and detecting an indicia of orientation of the substrate.
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