Device and method for coating objects at a high temperature
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United States of America Patent
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Jun 22, 2004
Grant Date -
Mar 27, 2003
app pub date -
Jul 16, 2002
filing date -
Dec 6, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The invention relates to a device for coating an object at a high temperature by means of cathode sputtering, having a vacuum chamber and a sputter source, the sputter source having a sputtering cathode. Inside the vacuum chamber is arranged an inner chamber formed from a heat-resistant material, which completely surrounds the sputtering cathode and the object to be coated, at a small spacing, and which has at least one opening to let a gas in and at least one opening to let a gas out.
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