Coating film forming system
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United States of America Patent
Stats
-
Jul 13, 2004
Grant Date -
Mar 27, 2003
app pub date -
Sep 13, 2002
filing date -
Sep 14, 2001
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A system for supplying a chemical to a substrate to form a liquid film of the chemical on the substrate. The system includes a plate having a slit between a nozzle portion movable in lateral directions, and a substrate held by a substrate holding portion movable in longitudinal directions. Shock eliminating portions, provided at left and right ends of the slit, inhibit mist from being produced from a coating liquid supplied outside of the slit. A pair of shutters are capable of washing the coating liquid received by the surfaces of the shock eliminating portions. In the vicinity of the slit, a suction port is provided over a range corresponding to a movable region of the nozzle for sucking mist produced when the nozzle is scanned to carry out coating. The plate has a slit for dispersing a downward flow outside of the slit.
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