Substrate cleaning system
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United States of America Patent
Stats
-
Jul 20, 2004
Grant Date -
Dec 5, 2002
app pub date -
Jun 1, 2001
filing date -
May 31, 2001
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A substrate cleaning system for cleaning wafers using a sheet-type wet cleaning treatment. The system has a sealable system body, a loading/unloading booth having a substrate carry-in section in which a plurality of substances are stocked to be carried in before a cleaning treatment is applied to them and a substrate carry-out section in which a plurality of substrates are stocked to be carried out after the cleaning treatment is applied, a processing booth provided with at least one sheet-type substrate cleaning chamber in which the cleaning treatment can be applied to a plurality of substrates by a plurality of cleaning solutions, and a robot booth provided with a transport robot for transporting the substrates one by one between the processing booth and the loading/unloading booth, the respective booths having partition walls.
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