Apparatus and method for mixing gases
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United States of America Patent
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-
Aug 10, 2004
Grant Date -
Oct 25, 2001
app pub date -
Jan 19, 2001
filing date -
Feb 4, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Provided are apparatuses and methods for mixing gases. The apparatuses are suitable for use in the manufacture of an electronic device. The apparatuses include a gas mixing manifold. A first, bulk gas source is connected to introduce a flow of a first gas to the manifold. A second gas source is connected to introduce a flow of a second gas to the manifold. The first and second gases are mixed in the manifold, thereby forming a gas mixture. A conduit is connected to one or more point of use for introducing a flow of the gas mixture thereto. The present invention is particularly applicable in the semiconductor manufacturing industry.
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