Apparatus and method for fast-cycle atomic layer deposition
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United States of America Patent
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Aug 10, 2004
Grant Date -
Jun 12, 2003
app pub date -
Aug 7, 2002
filing date -
Dec 6, 2001
priority date (Note) -
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Abstract
Method and apparatus for depositing layers by atomic layer deposition. A virtual shower curtain is established between the substrate support and chamber to minimize the volume in which the reactants are distributed. A showerhead may be used to allow closer placement of the substrate thereto, further reducing the reaction volume. Zero dead space volume valves with close placement to the chamber lid and fast cycle times also improve the cycle times of the process.
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