Chemical vapor deposition method and related material

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Aug 10, 2004
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Apr 25, 2003
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Sep 1, 2000

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Abstract

A process for chemical vapor deposition includes depositing a film using a metal .beta.-diketonate complex and an .alpha., .beta.-unsaturated alcohol. The metal .beta.-diketonate complex and the .alpha., .beta.-unsaturated alcohol is contacted on the substrate at the same time, at different times or alternately.

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Patent Owner	Address
TRI CHEMICAL LABORATORY INC	SAKURADAI 4002 NAKATSU AIKAWA-MACHI JAPAN AIKOH-GUN KANAGAWA 243-03

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C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....

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Inventor Name	Address	# of filed Patents	Total Citations
Funakubo, Hiroshi	Kawasaki, JP	46	471
Machida, Hideaki	Uenobara-machi, JP	31	109
Murakami, Yasushi	Nagano-ken, JP	60	1479

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Chemical vapor deposition method and related material

Number of patents in Portfolio can not be more than 2000

United States of America Patent

10422983

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DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
August 10, 2004	US,6773750,B2 US6773750B2	GRANTED PATENT AS SECOND PUBLICATION
October 30, 2003	US,20030203112,A1 US20030203112A1	FIRST PUBLISHED PATENT APPLICATION

PATENT NO	6773750
SERIAL NO	10422983
DOCKET NO

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10422983

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