pH buffered compositions useful for cleaning residue from semiconductor substrates

United States of America Patent

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Aug 10, 2004
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Sep 25, 2003
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Mar 25, 2002
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Mar 25, 2002

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Abstract

A semi-aqueous cleaning formulation useful for removing particles from semiconductor wafer substrates formed during a dry etching process for semiconductor devices, the cleaning formulation comprising a buffering system a polar organic solvent, and a fluoride source.

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ADVANCED TECHNOLOGY MATERIALS INC	7 COMMERCE DRIVE DANBURY CT 06810-4169

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Inventor Name	Address	# of filed Patents	Total Citations
Baum, Thomas H	New Fairfield, CT	315	10578
Bernhard, David	Newton, CT	22	460
Minsek, David	Pleasantville, NY	8	281
Seijo, Ma Fatima	Hayward, CA	13	327
Wojtczak, William A	Austin, TX	58	835

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pH buffered compositions useful for cleaning residue from semiconductor substrates

Number of patents in Portfolio can not be more than 2000

United States of America Patent

10105704

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PATENT NO	6773873
APP PUB NO	20030181342A1
SERIAL NO	10105704
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity Expired	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
August 10, 2004	US,6773873,B2 US6773873B2	GRANTED PATENT AS SECOND PUBLICATION
September 25, 2003	US,20030181342,A1 US20030181342A1	FIRST PUBLISHED PATENT APPLICATION

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10105704

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