Device parameter and gate performance simulation based on wafer image prediction
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United States of America Patent
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Aug 10, 2004
Grant Date -
Feb 26, 2004
app pub date -
Aug 20, 2002
filing date -
Aug 20, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A circuit, gate, or device parameter simulation includes data on the initial conditions of manufacture, including illumination conditions on a stepper, material parameters for processing conditions, and chip layout. Optical effects and processing tolerances may be accounted for in the simulation of the final device performance characteristics. The circuit, gate, or device parameter simulation may incorporate optical proximity code software. Simulated active and passive components are generated by the circuit, gate, or device parameter simulation from the simulated patterned layers on the substrate. Feedback may be provided to the circuit, gate, or device parameter simulation to optimize performance.
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