Vacuum treatment system and process for manufacturing workpieces
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United States of America Patent
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-
Aug 31, 2004
Grant Date -
Jul 31, 2003
app pub date -
Mar 7, 2003
filing date -
May 25, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A vacuum treatment system has a vacuum treatment chamber, has an ACTUAL value sensor to establish a treatment atmosphere in the form of a regulating element of a control circuit. The treatment atmosphere in the treatment area is modulated according to a defined profile as a function of the workpiece carrier position. The system and process deposits defined layer thickness distribution profiles on substrates in a reactive coating.
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