Hydrothermal treatment of nanostructured films
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United States of America Patent
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Sep 7, 2004
Grant Date -
Aug 21, 2003
app pub date -
Oct 23, 2002
filing date -
Jul 28, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention involves the hydrothermal treatment of nanostructured films to form high k PMOD.TM. films for use in applications that are temperature sensitive, such as applications using a polymer based substrate. After a PMOD.TM. precursor is deposited and converted on a substrate, and possibly after other process steps, the amorphous, nanoporous directly patterned film is subjected to low temperature hydrothermal treatment to densify and possibly crystallize the resulting high dielectric PMOD.TM. film. A post hydrothermal treatment bake is then performed to remove adsorped water.
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