Illumination device for projection system and method for fabricating
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United States of America Patent
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Sep 7, 2004
Grant Date -
Sep 12, 2002
app pub date -
Mar 8, 2002
filing date -
Oct 22, 1998
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A masking aperture for a photomask illumination system provides controlled on-axis and off-axis illumination. The masking aperture has a dithered pattern of pixels. The intensity of the pattern controls the illumination of the photomask. The masking aperture pattern defines one or more zones of illumination. Zones comprise elements that are patterned in accordance with a selected wavelength of incident light to diffract the incident light into an illumination pattern for illuminating a photomask. Each of the elements is constructed with a matrix of pixels. In the preferred embodiment the array of pixels is 8.times.8. The number of elements is generally greater than 3.times.3.
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Cited Art Landscape
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