Apparatus and method for rapid photo-thermal surfaces treatment
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United States of America Patent
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Oct 12, 2004
Issued Date -
N/A
app pub date -
Oct 10, 2001
filing date -
Jan 7, 1998
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Expired
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Abstract
An apparatus for surface treating a semiconductor wafer includes a surface treatment chamber and a source of radiation. The semiconductor wafer disposed inside the chamber is illuminated with radiation sufficient to create a plurality of electron-hole pairs near the surface of the wafer and to desorb ions and molecules adsorbed on the surface of the wafer.
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