Interference filter fabrication
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 12, 2004
Grant Date -
N/A
app pub date -
Sep 28, 2001
filing date -
Sep 28, 2001
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An interference filter (10) and a process (100) by which it may be fabricated. A substrate (12, 52, 82) is provided and a working region (56, 84) is defined therein or thereupon. Relative to the horizontal substrate (12, 52, 82), a plurality of vertical layers having differing refractive index are then constructed by applying material into the working region (56, 84) or altering material already in the working region (56, 84). Photo masking and etching processes may be used to selectively remove material in the working region (56, 84) for applying additional material having a differing refractive index. Photo masking and impurity doping processes may be used to selectively change material to have a differing refractive index.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully