System for and method of processing substrate
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United States of America Patent
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Oct 19, 2004
Grant Date -
Jan 1, 2004
app pub date -
Jun 11, 2003
filing date -
Jun 26, 2002
priority date (Note) -
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Abstract
A reference command value is transmitted from an apparatus server (90) through a network (96d) to spin processing units (SR1-SR4) of a substrate processing apparatus (1). Next, a plurality of correction amounts for making processing states in the respective spin processing units (SR1-SR4) substantially the same are computed from a plurality of measured values corresponding to the respective spin processing units (SR1-SR4) and the reference command value, and are additionally stored in a correction amount database (90a). For execution of substrate processing, a plurality of correction amounts corresponding to the reference command value are extracted from the database, and corresponding ones of the correction amounts plus the reference command value are transmitted to the respective spin processing units (SR1-SR4).
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