Method for fabricating an integrated optical isolator and a novel wire grid structure
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United States of America Patent
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Nov 2, 2004
Grant Date -
Dec 19, 2002
app pub date -
Jun 19, 2001
filing date -
Jun 19, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method for fabricating an integrated optical isolator includes depositing a wire grid material on a magneto-optical substrate and depositing a resist film on the wire grid material. The method further includes bringing a mold with a wire grid pattern on contact with the resist film and compressing the mold and resist film together so as to emboss the wire grid pattern in the resist film. The method further includes transferring the wire grid pattern in the resist film to the wire grid material on the magneto-optical substrate by etching.
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