Substrate treating apparatus
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United States of America Patent
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Nov 9, 2004
Grant Date -
Oct 2, 2003
app pub date -
Mar 20, 2003
filing date -
Mar 28, 2002
priority date (Note) -
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Abstract
A substrate treating apparatus includes a heat-treating unit having a cooling unit and a local transport mechanism. The local transport mechanism, in time of standby, is placed in a standby position inside the cooling unit. The local transport mechanism in the standby position influences, and is influenced by, the environment outside the heat-treating unit less than where the local transport mechanism is kept on standby outside the heat-treating unit. Variations in substrate treating precision due to such adverse influences are reduced to perform substrate treatment with high precision.
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