Coating and developing apparatus and pattern forming method
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United States of America Patent
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-
Nov 9, 2004
Grant Date -
Jun 20, 2002
app pub date -
Dec 7, 2001
filing date -
Dec 8, 2000
priority date (Note) -
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status (Latency Note)
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Abstract
A coating and developing apparatus has an interface section equipped with a temperature adjuster (a cooling unit). A temperature-raised substrate due to exposure on periphery of the substrate outside a circuit-forming area thereon is adjusted to a predetermined temperature by the temperature adjuster and then transferred to an exposing apparatus. The temperature adjustments before exposure provide almost the same temperature over many substrates to be transferred to the exposing apparatus for less thermal effects to exposing processing, thus achieving high yields. The interface section is further provided with first and second transfer mechanisms, the first serving to transfer substrates between the processor and the exposing apparatus and the second serving to transfer substrates to each unit of a shelf section, for high transfer performance, thus achieving high throughput.
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