Testing apparatus and method for determining an etch bias associated with a semiconductor-processing step
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 9, 2004
Grant Date -
N/A
app pub date -
Sep 29, 2003
filing date -
Sep 29, 2003
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A testing apparatus for determining the etch bias associated with a semiconductor-processing step includes a substrate, a first cathode finger with a first width on the substrate, a second cathode finger with a second width on the substrate, and a cathode large area on the substrate wherein the cathode large area has a third width W' and a length L' that are both substantially larger than either of the first and second widths.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully