Device and method for cleaning substrates
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United States of America Patent
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Nov 16, 2004
Grant Date -
N/A
app pub date -
Apr 18, 2002
filing date -
Oct 19, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The inventive device for cleaning substrates, especially semiconductor wafers, comprises a treatment basin for receiving at least one substrate, a cover for sealing said treatment basin, a first feeding device for controllably feeding in a reactive gas, a second feeding device for controllably feeding in at least one moist fluid for promoting a reaction between the reactive gas and a deposit to be removed from the substrate and a control device for controlling the concentration of moisture in the treatment basin.
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Cited Art Landscape
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