Process for producing abrasive particles and abrasive particles produced by the process
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United States of America Patent
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Nov 16, 2004
Grant Date -
May 22, 2003
app pub date -
Sep 25, 2002
filing date -
Nov 16, 2001
priority date (Note) -
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Abstract
The present invention provides a process for producing particles suitable for use as abrasives in chemical-mechanical polishing slurries. The process according to the invention includes mixing at least one crystallization promoter such as Ti[OCH(CH.sub.3).sub.2)].sub.4 with at least one cerium compound and at least one solvent, and subjecting said mixture to hydrothermal treatment at a temperature of from about 60.degree. C. to about 700.degree. C. to produce the particles. Particles formed in accordance with the present invention exhibit a large crystallite size, and can be used to polish silicon-containing substrates to a high degree of planarity at a relatively high rate.
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