Cut and puncture resistant laminated fabric
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United States of America Patent
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Nov 16, 2004
Grant Date -
N/A
app pub date -
Oct 24, 1997
filing date -
Oct 24, 1997
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The invention relates to a process for making a puncture resistant laminated fabric comprising laminating a layer of polyethylene film to a layer of fabric comprised of an ultra high molecular weight polyethylene. The laminating step is conducted at a temperature between about 230.degree. F. and about 290.degree. F. with a contact time of between about 5 minutes and about 15 minutes with the application of a laminating pressure of between about 50 psi and about 500 psi.
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