Methods and systems for determining a presence of macro defects and overlay of a specimen
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United States of America Patent
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Nov 16, 2004
Grant Date -
Jun 17, 2004
app pub date -
Oct 22, 2003
filing date -
Sep 20, 2000
priority date (Note) -
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status (Latency Note)
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Abstract
Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a presence of macro defects and overlay of a specimen. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
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