Lithographic apparatus, device manufacturing method, and device manufactured thereby
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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-
Nov 16, 2004
Grant Date -
Apr 11, 2002
app pub date -
Aug 22, 2001
filing date -
Aug 24, 2000
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The X, Y and Rx positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be co-planar with the pattern on the mask itself. Measurements of the table position in the other degrees of freedom can be measured with capacitative or optical height sensors.
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