Exposure apparatus including interferometer system
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United States of America Patent
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-
Nov 16, 2004
Grant Date -
Aug 15, 2002
app pub date -
Feb 12, 2002
filing date -
Feb 15, 2001
priority date (Note) -
In Force
status (Latency Note)
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Abstract
To accurately measure the position and posture of a stage apparatus used in an exposure apparatus or the like, the Z position and displacement of a top stage (27) are measured using as a reference a lens barrel support (35) independently of the top stage in terms of vibrations by an interferometer system which includes a projection optical system (34) for projecting a pattern formed on a master onto a substrate, stages (27, 31, 40) capable of moving with respect to the projection optical system (34) while holding the substrate or master, and a lens barrel support (35) that supports the projection optical system (34), and which uses a Z measuring mirror (30) that is arranged on a Y stage (31) and has a reflecting surface almost parallel to the XY plane, and a Z interferometer (25) arranged on the Y stage (31).
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