Gas distribution system for cyclical layer deposition
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United States of America Patent
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Nov 23, 2004
Grant Date -
Apr 8, 2004
app pub date -
Jan 29, 2003
filing date -
Oct 2, 2002
priority date (Note) -
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Abstract
Embodiments of the invention are generally directed to a cyclical layer deposition system, which includes a processing chamber, at least one load lock chamber connected to the processing chamber, a plurality of gas ports disposed on the processing chamber. The gas ports are configured to transmit one or more gas streams into the processing chamber. The system further includes a plurality of vacuum ports disposed on the processing chamber between the gas ports. The vacuum ports are configured to transmit the gas streams out of the processing chamber.
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