Micro-fluidic devices
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United States of America Patent
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Nov 30, 2004
Grant Date -
Jan 30, 2003
app pub date -
Jul 24, 2001
filing date -
Jul 24, 2001
priority date (Note) -
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status (Latency Note)
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Abstract
In a method of fabricating a microstructure for micro-fluidics applications, a mechanically stable support layer is formed over a layer of etchable material. An anisotropic etch is preformed through a mask to form a pattern of holes extending through the support layer into said etchable material. An isotropic etch is performed through each said hole to form a corresponding cavity in the etchable material under each hole and extending under the support layer. A further layer of depositable material is formed over the support layer until portions of the depositable layer overhanging each said hole meet and thereby close the cavity formed under each hole. The invention permits the formation of micro-channels and filters of varying configuration.
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