Method of liquid deposition by selection of liquid viscosity and other precursor properties
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United States of America Patent
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Dec 14, 2004
Grant Date -
Jul 18, 2002
app pub date -
Mar 12, 2002
filing date -
Feb 3, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A plurality of liquids, the flow of each controlled by a volumetric flowrate controller, are mixed in a mixer to form a final precursor that is misted and then deposited on a substrate. A physical property of precursor liquid is adjusted by adjusting the volumetric flowrate controllers, so that when precursor is applied to substrate and treated, the resulting thin film of solid material has a smooth and planar surface. Typically the physical property is the viscosity of the precursor, which is selected to be relatively low, in the range of 1-2 centipoise.
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