Method of processing PFC and apparatus for processing PFC

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 6838011
APP PUB NO 20020033377A1
SERIAL NO

09805382

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention relates to a method and an apparatus for processing PFC, which does not damage a vacuum pump, and in which maintenance and inspection works are readily performed, and an incineration process is not required. The processing apparatus 10 is constructed with a vacuum chamber 12, and a vacuum pump 16, a reaction gas introduction section 17, a plasma process section 18 and a polymer collection section 20 that are successively disposed through a piping 14 in a succeeding stage of the vacuum chamber 12.

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Patent Owner(s)

Patent OwnerAddress
SEIKO EPSON CORPORATION4-1 NISHI-SHINJUKU 2-CHOME SHINJUKU-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Namose, Isamu Suwa, JP 28 376

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