Method for forming I-carbon film

United States of America Patent

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Jan 4, 2005
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app pub date
Jul 8, 2002
filing date
Apr 27, 1987

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Expired

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Abstract

A film comprising an i-carbon is formed by converting a reactive gas containing a carbon compound gas into plasma by a resonance using a microwave and a magnetic field.

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Patent Owner	Address
SEMICONDUCTOR ENERGY LABORATORY CO LTD	398 HASE ATSUGI-SHI KANAGAWA 2430036 ?2430036

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H05H:PLASMA TECHNIQUE

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Inventor Name	Address	# of filed Patents	Total Citations
Hirose, Naoki	Atsugi, JP	48	1792
Inujima, Takashi	Atsugi, JP	35	1500
Takayama, Toru	Atsugi, JP	534	28168

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Method for forming I-carbon film

Number of patents in Portfolio can not be more than 2000

United States of America Patent

10189422

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US Family Size	Non-US Coverage
Patent Longevity Expired	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
January 04, 2005	US,6838126,B2 US6838126B2	GRANTED PATENT AS SECOND PUBLICATION
January 30, 2003	US,20030021910,A1 US20030021910A1	FIRST PUBLISHED PATENT APPLICATION

PATENT NO	6838126
SERIAL NO	10189422
DOCKET NO

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10189422

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