MEMS element manufacturing method
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United States of America Patent
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-
Jan 4, 2005
Grant Date -
Apr 22, 2004
app pub date -
Aug 25, 2003
filing date -
Dec 26, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention is directed to manufacturing methods of electrostatic type MEMS devices. The manufacturing method of the present invention includes the steps of forming a substrate side electrode on a substrate, forming a fluid film before or after forming a sacrificial layer, further forming a beam having a driving side electrode on a planarized surface of the fluid film, and finally, removing the sacrificial layer. Furthermore, performing the foregoing method planarizes the surface of a driving side electrode, reduces fluctuations in the shape of a beam, and improves the performance and the uniformity of the MEMS device.
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