Method and system for probing, testing, burn-in, repairing and programming of integrated circuits in a closed environment using a single apparatus
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United States of America Patent
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-
Jan 4, 2005
Grant Date -
Jan 17, 2002
app pub date -
Sep 6, 2001
filing date -
May 16, 1988
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A single gas tight system may perform multi-functions including reducing the thickness of oxides on contact pads and probing, testing, burn-in, repairing, programming and binning of integrated circuits. A holding fixture holds a wafer having integrated circuits and aligns the wafer to a full-substrate probing device. A temperature control device is used to heat the wafer during an oxide reduction process or during burn-in of the wafer. During the oxide reduction process, hydrogen is introduced into the chamber, and the wafer is heated so that the oxides on the contact pads can combine with hydrogen to form water vapor, thus reducing the thickness of the oxides. A computer analyzes the test and/or burn-in data and provides control signals for repairing or programming the integrated circuits.
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